发明名称 COMPOSITION FOR TEXTURE FORMATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for texture formation for a silicon substrate surface capable of forming fine uneven portions with less variation to form the silicon substrate with low reflectance, and the forming method thereof. <P>SOLUTION: This is a composition for texture formation which contacts with a silicon substrate surface to form uneven portions on the surface, and by bringing the composition for texture formation consisting of water, base and an amide compound having an amide bond and the texture composition into contact with the silicon substrate surface, uneven potions are formed on the substrate surface. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011238791(A) 申请公布日期 2011.11.24
申请号 JP20100109321 申请日期 2010.05.11
申请人 TOKUYAMA CORP 发明人 YATABE OSAMU;MURATA AKIKO
分类号 H01L21/306;H01L21/308;H01L31/04 主分类号 H01L21/306
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