发明名称 |
PRECURSOR COMPOSITIONS AND METHODS |
摘要 |
Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.
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申请公布号 |
US2011287184(A1) |
申请公布日期 |
2011.11.24 |
申请号 |
US201113204654 |
申请日期 |
2011.08.06 |
申请人 |
SHENAI-KHATKHATE DEODATTA VINAYAK;MANZIK STEPHEN J.;WANG QING-MIN;ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
SHENAI-KHATKHATE DEODATTA VINAYAK;MANZIK STEPHEN J.;WANG QING-MIN |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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