发明名称 CHALCOGENIDE-BASED MATERIALS AND METHODS OF MAKING SUCH MATERIALS UNDER VACUUM USING POST-CHALCOGENIZATION TECHNIQUES
摘要 <p>The present invention provides strategies for making high quality CIGS photoabsorbing compositions on a substrate (18) from sputtered precursor film(s) (112). The precursors are converted into CIGS photoabsorbing material via a chalcogenizing treatment (also referred to as "post - chalcogenization", including, e.g., "post-selenization" when Se is used and/or "post-sulfurization" when S is used) using techniques that allow the post-chalcogenizing treatment to occur under atypically low pressure conditions. Consequently, the strategies of the invention are readily incorporated into batch processes or continuous processes such as roll-to-roll process occurring under vacuum. The present invention is useful at lab, pilot plant, and industrial scales. The precursor film (112) is capped by a second layer (114) such as elemental chalcogen using evaporation and then heat treated to form a chalcogenized layer (20).</p>
申请公布号 WO2011146301(A1) 申请公布日期 2011.11.24
申请号 WO2011US36165 申请日期 2011.05.12
申请人 DOW GLOBAL TECHNOLOGIES LLC;NICHOLS, BETH, M.;NILSSON, ROBERT, T.;LANGLOIS, MARC, G.;XIONG, RENTIAN 发明人 NICHOLS, BETH, M.;NILSSON, ROBERT, T.;LANGLOIS, MARC, G.;XIONG, RENTIAN
分类号 C23C14/06;C23C14/24;C23C14/34;C23C14/58 主分类号 C23C14/06
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