| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a periphery exposure apparatus and a periphery exposure method, with which it becomes possible to make uniform an exposure amount per substrate unit area within an exposure region on the occasion of exposure of the periphery of a circular substrate. <P>SOLUTION: A lighting control plate 30, whose transmittance of light from a light irradiation part 2 continuously changes between, for instance, 0% and 100% in accordance with a position in its lengthwise direction, is provided between the light irradiation part 2 and a substrate. The lighting control plate 30 is set movable along the lengthwise direction and controllable for positioning and is adjusted in position by a controller so that illuminance of exposure of the substrate corresponds to a travelling speed of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
