发明名称 Bottom anode schottky diode structure and method
摘要 This invention discloses a bottom-anode Schottky (BAS) diode that includes an anode electrode disposed on a bottom surface of a semiconductor substrate. The bottom-anode Schottky diode further includes a sinker dopant region disposed at a depth in the semiconductor substrate extending substantially to the anode electrode disposed on the bottom surface of the semiconductor and the sinker dopant region covered by a buried Schottky barrier metal functioning as a Schottky anode. The BAS diode further includes a lateral cathode region extended laterally from a cathode electrode near a top surface of the semiconductor substrate opposite the Schottky barrier metal wherein the lateral cathode region doped with an opposite dopant from the sinker dopant region and interfacing the sinker dopant region whereby a current path is formed from the cathode electrode to the anode electrode through the lateral cathode region and the sinker dopant region in applying a forward bias voltage and the sinker dopant region depleting the cathode region in applying a reverse bias voltage for blocking a leakage current.
申请公布号 US2011287616(A1) 申请公布日期 2011.11.24
申请号 US201113135371 申请日期 2011.06.30
申请人 HEBERT FRANCOIS;ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED 发明人 HEBERT FRANCOIS
分类号 H01L21/22 主分类号 H01L21/22
代理机构 代理人
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