METHOD FOR FORMATION OF CONCAVO-CONVEX PATTERN USING RESIN FILM, AND DEVICE FOR USE IN THE METHOD

摘要

Disclosed is a method for forming a fine concavo-convex pattern on a substrate using a resin film, which can form the concavo-convex pattern accurately at a position at which the concavo-convex pattern is to be formed on the substrate even when the fluctuation in shrinking ratios of the resin film, the change in temperature in an alignment step or the like occurs. Specifically disclosed are: a method for forming a concavo-convex pattern by transferring a fine concavo-convex pattern formed on the surface of a resin film (11) onto a photocurable resin layer (16) that is formed on a substrate (15) and comprises a photocurable resin composition to thereby form a fine inverted concavo-convex pattern on the photocurable resin layer (16), wherein the method is characterized by involving a step of aligning the resin film (11) with the substrate (15) for the purpose of placing the concavo-convex pattern formed on the resin film (11) at a position at which the inverted concavo-convex pattern to be formed on the photocurable resin layer (16) on the substrate (15), wherein the aligning step involves a substep of using an extension means that can extend the resin film (11) in the plane direction; and a device for use in the method.