CONCENTRIC HOLLOW CATHODE MAGNETRON SPUTTER SOURCE,申请号EP20090702653-传众专利搜索

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发明名称	CONCENTRIC HOLLOW CATHODE MAGNETRON SPUTTER SOURCE
摘要
申请公布号	EP2387625(A1)	申请公布日期	2011.11.23
申请号	EP20090702653	申请日期	2009.01.21
申请人	4D-S PTY LTD.	发明人	BRORS, DANIEL;SCHMIDT, DOMINIK;HAWRAN, MICHAEL;CORREIA, DAVE;SHULENBERGER, ART
分类号	C23C14/00	主分类号	C23C14/00
代理机构		代理人
主权项
地址

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