| 摘要 |
<p>PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided to blocks the passage of ultraviolet wavelength causing the partial loss of a lithography apparatus by applying an adhesive film supporting coating. CONSTITUTION: In a lithographic apparatus having parts with a coated film adhered thereto, various hoses are formed in the top side of a substrate support(WT). A transmission image sensor(2), a spot sensor(3), and an integrated lens interferometer are formed around the holes. An adhesive film(5) supports a functional coating(6). The adhesive film coats the top side of a substrate support frame excepting a recess(1). The adhesive film is formed in the adhesive film.</p> |
