发明名称 Method of manufacturing master plate, method of manufacturing microneedle patch, microneedle patch and exposure apparatus
摘要 A method of manufacturing a master plate includes the steps of forming a photoresist film on a substrate, disposing a photomask having a plurality of island radiation shields on the photoresist film followed by integrating the photomask and the photoresist film, applying light from a light source to the photoresist film through the photomask for selectively exposing the photoresist film, and developing the photoresist film to form a master plate, in which the method includes irradiating the photoresist film with the light from plural directions through the photomask to selectively expose the photoresist film from the respective directions.
申请公布号 US8062835(B2) 申请公布日期 2011.11.22
申请号 US20090379308 申请日期 2009.02.18
申请人 TOMONO TAKAO;TOPPAN PRINTING CO., LTD. 发明人 TOMONO TAKAO
分类号 G03F7/26;A61M3/00 主分类号 G03F7/26
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