发明名称 Method of producing a plate-shaped structure, in particular, from silicon, use of said method and plate-shaped structure thus produced, in particular from silicon
摘要 Method for fabricating a structure in the form of a plate, and structure in the form of a plate, in particular formed from silicon, including at least one substrate, a superstrate and at least one intermediate layer interposed between the substrate and the superstrate, in which the intermediate layer comprises at least one base material having distributed therein atoms or molecules termed extrinsic atoms or molecules which differ from the atoms or molecules of the base material, and in which a heat treatment is applied to said plate so that, in the temperature range of said heat treatment, the intermediate layer is plastically deformable and the presence of the selected extrinsic atoms or molecules in the selected base material causes the irreversible formation of micro-bubbles or micro-cavities in the intermediate layer.
申请公布号 US8062564(B2) 申请公布日期 2011.11.22
申请号 US20040574120 申请日期 2004.09.23
申请人 BRUEL MICHEL;S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 BRUEL MICHEL
分类号 B29C44/34;B29C65/00;B32B37/00;C30B33/00;C30B33/02;H01L21/20;H01L21/30;H01L21/46;H01L21/762 主分类号 B29C44/34
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