METHOD FOR DETECTING PATTERN OFFSET BETWEEN EXPOSURING REGIONS AND DETECTING PATTERN

摘要

PURPOSE: A measuring method of the pattern shift amount between exposure areas, and a measuring mark for the method are provided to rapidly measure the pattern shift amount in real time, and to improve the fault detection rate and the yield. CONSTITUTION: A measuring method of the pattern shift amount between exposure areas comprises the following steps: forming a pair of conductive measuring marks(6,7) with the predetermined position using a patterning process by exposing for 2 times; measuring the electrical property of the conductive measuring marks; and confirming the success or failure of the pattern shift amount between the exposure areas by the electrical property of the conductive measuring marks.