发明名称 Lithographic apparatus and thermal optical manipulator control method
摘要 A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
申请公布号 US8064151(B2) 申请公布日期 2011.11.22
申请号 US20070889583 申请日期 2007.08.14
申请人 JANSEN BASTIAAN STEPHANUS HENDRICUS;SCHOENHOFF ULRICH;HAUF MARKUS;ASML NETHERLANDS B.V. 发明人 JANSEN BASTIAAN STEPHANUS HENDRICUS;SCHOENHOFF ULRICH;HAUF MARKUS
分类号 G02B7/02;H05B1/02 主分类号 G02B7/02
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