发明名称 |
Chemically amplified positive resist composition |
摘要 |
The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.
|
申请公布号 |
US8062830(B2) |
申请公布日期 |
2011.11.22 |
申请号 |
US20090425759 |
申请日期 |
2009.04.17 |
申请人 |
FUJI YUSUKE;SHIGEMATSU JUNJI;MIYAGAWA TAKAYUKI;ANDO NOBUO;TAKEMOTO ICHIKI;SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
FUJI YUSUKE;SHIGEMATSU JUNJI;MIYAGAWA TAKAYUKI;ANDO NOBUO;TAKEMOTO ICHIKI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|