发明名称 |
Exposure apparatus, exposure method, and device producing method |
摘要 |
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy. |
申请公布号 |
US8064044(B2) |
申请公布日期 |
2011.11.22 |
申请号 |
US20040584950 |
申请日期 |
2004.12.27 |
申请人 |
NAGASAKA HIROYUKI;NIKON CORPORATION |
发明人 |
NAGASAKA HIROYUKI |
分类号 |
G03B27/58;G03B27/42;G03F7/20 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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