发明名称 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
摘要 VAPOR DEPOSITION APPARATUS AND PROCESS FOR CONTINUOUS INDIRECT DEPOSITION OF A THIN FILM LAYER ON A SUBSTRATE A13STRACT OF THE DISCLOSURE An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A deposition head is configured for sublimating a source material supplied thereto. The sublimated source material condenses onto a transport conveyor disposed below the deposition head. A substrate conveyor is disposed below the transport conveyor and conveys substrates in a conveyance path through the apparatus such that an upper surface of the substrates is opposite from and spaced below a lower leg of the transport conveyor. A heat source is configured adjacent the lower leg of the transport conveyor. The Source material plated onto the transport conveyor is sublimated along the lower leg and condenses onto to the upper surface of substrates conveyed by the substrate conveyor.
申请公布号 AU2011201782(A1) 申请公布日期 2011.11.17
申请号 AU20110201782 申请日期 2011.04.19
申请人 PRIMESTAR SOLAR, INC. 发明人 BLACK, RUSSELL WELDON
分类号 H01L21/203;C23C14/00 主分类号 H01L21/203
代理机构 代理人
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