| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of performing natural oxide film removal processing on a solar cell substrate with high throughput in a step of manufacturing a solar cell. <P>SOLUTION: A method of forming an antireflection film on a surface of the solar cell substrate using the parallel plate type plasma CVD device comprises a removal step of generating plasma including nitrogen ions between a high frequency electrode and a substrate electrode by supplying first processing gas from a processing gas supply device and also applying high frequency electric power of first frequency from a high frequency power source to the high frequency electrode, and removing an oxide film on the solar cell substrate with the nitrogen ions; and a film formation step of generating plasma for forming the antireflection film on the surface of the solar cell substrate between the high frequency electrode and substrate electrode by supplying second processing gas from the processing gas supply device and also applying high frequency electric power of second frequency (>first frequency) from the high frequency power source to the high frequency electrode, and forming the antireflection film on the surface of the solar cell substrate with the plasma. <P>COPYRIGHT: (C)2012,JPO&INPIT |
