发明名称 |
EUV Lithography Device and Method For Processing An Optical Element |
摘要 |
An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) comprises a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.
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申请公布号 |
US2011279799(A1) |
申请公布日期 |
2011.11.17 |
申请号 |
US201113088299 |
申请日期 |
2011.04.15 |
申请人 |
SINGER WOLFGANG;KWAN YIM-BUN-PATRICK;SCHMIDT STEFAN-WOLFGANG;EHM DIRK HEINRICH;KRAUS DIETER;WIESNER STEFAN;KOEHLER STEFAN;CZAP ALMUT;CHUNG HIN YIU ANTHONY;CARL ZEISS SMT GMBH |
发明人 |
SINGER WOLFGANG;KWAN YIM-BUN-PATRICK;SCHMIDT STEFAN-WOLFGANG;EHM DIRK HEINRICH;KRAUS DIETER;WIESNER STEFAN;KOEHLER STEFAN;CZAP ALMUT;CHUNG HIN YIU ANTHONY |
分类号 |
G03B27/42;G03F1/82;G03F1/86 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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