发明名称 |
SEMICONDUCTOR COMPONENT COMPRISING DEFECT-RICH LAYER FOR OPTIMALLY CONTACTING EMITTERS, AND METHOD FOR THE PRODUCTION THEREOF |
摘要 |
The invention relates to a semiconductor component made of a semiconductor material, which component has a defect-rich semiconductor layer with a defect concentration of at least 103 defects per cm2 disposed on a surface of the semiconductor component. The invention likewise relates to a method for producing said semiconductor component, a semiconductor layer being applied to the semiconductor material by means of physical or chemical vapor deposition and sintered in a further operating step, e.g., during or following vapor deposition. The desired defect concentration in the applied semiconductor layer is then set. |
申请公布号 |
WO2011141142(A1) |
申请公布日期 |
2011.11.17 |
申请号 |
WO2011EP02244 |
申请日期 |
2011.05.05 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER;SCHMICH, EVELYN;HOERTEIS, MATTHIAS;GLUNZ, STEFAN |
发明人 |
SCHMICH, EVELYN;HOERTEIS, MATTHIAS;GLUNZ, STEFAN |
分类号 |
H01L31/0216;H01L31/0224;H01L31/18 |
主分类号 |
H01L31/0216 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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