发明名称 SEMICONDUCTOR COMPONENT COMPRISING DEFECT-RICH LAYER FOR OPTIMALLY CONTACTING EMITTERS, AND METHOD FOR THE PRODUCTION THEREOF
摘要 The invention relates to a semiconductor component made of a semiconductor material, which component has a defect-rich semiconductor layer with a defect concentration of at least 103 defects per cm2 disposed on a surface of the semiconductor component. The invention likewise relates to a method for producing said semiconductor component, a semiconductor layer being applied to the semiconductor material by means of physical or chemical vapor deposition and sintered in a further operating step, e.g., during or following vapor deposition. The desired defect concentration in the applied semiconductor layer is then set.
申请公布号 WO2011141142(A1) 申请公布日期 2011.11.17
申请号 WO2011EP02244 申请日期 2011.05.05
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER;SCHMICH, EVELYN;HOERTEIS, MATTHIAS;GLUNZ, STEFAN 发明人 SCHMICH, EVELYN;HOERTEIS, MATTHIAS;GLUNZ, STEFAN
分类号 H01L31/0216;H01L31/0224;H01L31/18 主分类号 H01L31/0216
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