发明名称 PEELING METHOD AND PEELING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To peel a support plate from a wafer in an easier manner. <P>SOLUTION: In the peeling method of this invention, a support plate 3 is peeled from a wafer 2 where the support plate 3 is stuck by means of an adhesive layer 4 formed with an adhesive compound showing a solubility with respect to non-polar solvents or an adhesive compound showing a solubility with respect to high-polarity solvents. The peeling method includes the process to supply the non-polar solvents or the high-polarity solvents to the adhesive layer 4. Therefore, it is not necessary to protect a dicing tape 5 stuck to the wafer 2 when solvents are supplied. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011233679(A) 申请公布日期 2011.11.17
申请号 JP20100102074 申请日期 2010.04.27
申请人 TOKYO OHKA KOGYO CO LTD 发明人 INAO YOSHIHIRO
分类号 H01L21/304;H01L21/683 主分类号 H01L21/304
代理机构 代理人
主权项
地址