发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM COMPRISING THE SAME
摘要 The present invention relates to a photosensitive resin composition which is developable with an alkaline aqueous solution and does not need a high temperature for curing and the like, and has all the properties suitable for use in a cover film of a printed circuit board or a laminated body for a semiconductor, and a dry film comprising the same. The photosensitive resin composition comprises (A) a polyamic acid comprising a polymer of at least one diamine compound and at least one acid dianhydride; (B) a photopolymerizable compound having at least one polymerizable ethylenic unsaturated bond in its molecule; and (C) a photoinitiator.
申请公布号 US2011278049(A1) 申请公布日期 2011.11.17
申请号 US201113191027 申请日期 2011.07.26
申请人 KIM HEE-JUNG;KYUNG YOU-JIN;LEE KWANG-JOO;LG CHEM, LTD. 发明人 KIM HEE-JUNG;KYUNG YOU-JIN;LEE KWANG-JOO
分类号 H05K1/02;G03F7/028;G03F7/32;H05K1/03 主分类号 H05K1/02
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