发明名称 SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-reliability semiconductor memory having improved flatness of a top surface of a contact plug located under a memory element. <P>SOLUTION: The semiconductor memory comprises: a semiconductor substrate; a plurality of switching transistors provided on the semiconductor substrate; a contact plug that is buried between two adjacent switching transistors, is isolated from each gate of the two adjacent switching transistors and electrically connected to sources or drains of the two adjacent switching transistors, and whose top surface is located at a higher position than the top surfaces of the switching transistors; a memory element storing data, which is formed on a top surface of the contact plug; and wiring provided on the memory element. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011233835(A) 申请公布日期 2011.11.17
申请号 JP20100105450 申请日期 2010.04.30
申请人 TOSHIBA CORP 发明人 KANAYA HIROYUKI;KOYAMA YUKINORI;SHUDO SUSUMU;SUGIURA KUNIAKI
分类号 H01L27/105;H01L21/768;H01L21/8246;H01L27/10;H01L43/08 主分类号 H01L27/105
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