| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a blank mask, a photomask and a method for manufacturing the same. <P>SOLUTION: A blank mask is provided by sequentially laminating a transparent substrate, a metal film, a hard mask film, and a resist film. At least one of the metal film and the hard mask film has a composition transition region where a composition ratio of at least one of the elements constituting the film continuously changes in a depth direction of the film. Thereby, it is improved in optical density uniformity, reflectivity uniformity, surface roughness, chemical resistance, light-exposure resistance and the like, and it is also reduced problems of grown-in defects and residual stress, compared to an existing thin film having an uniform composition ratio of the elements in a depth direction of the film. <P>COPYRIGHT: (C)2012,JPO&INPIT |
