发明名称 AUTOMATIC LAYOUT CONVERSION FOR FINFET DEVICE
摘要 A method for generating a layout for a FinFET device is disclosed. The method includes receiving an initial layout containing an active region that has an edge extending in a first direction. The method includes designating a portion of the layout as a first region. The first region contains the active region. The method includes designating an elongate portion of the first region as a second region that extends in the first direction. The method includes designating a different elongate portion of the first region as a third region that extends in the first direction and that is adjacent to the second region in a second direction perpendicular to the first direction. The method includes enlarging the active region if the edge of the active region falls inside the third region, and shrinking the active region if the edge of the active region falls outside the third region.
申请公布号 US2011283245(A1) 申请公布日期 2011.11.17
申请号 US20100780060 申请日期 2010.05.14
申请人 SHEN JENG-JUNG;YU SHAO-MING;CHANG CHIH-SHENG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 SHEN JENG-JUNG;YU SHAO-MING;CHANG CHIH-SHENG
分类号 G06F17/50 主分类号 G06F17/50
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