发明名称 NITRIDE-BASED SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 A nitride-based semiconductor device includes a substrate constituted by nitride-based semiconductor, a nitride-based semiconductor layer formed on the substrate and constituted by nitride-based semiconductor, formed with a light waveguide extending in a first direction, and first step portions formed at least on regions other than the vicinity of facets of the light waveguide from a surface opposite to a side where the nitride-based semiconductor layer of the substrate is formed along the first direction in which the light waveguide extends.
申请公布号 US2011281382(A1) 申请公布日期 2011.11.17
申请号 US201113193431 申请日期 2011.07.28
申请人 BESSHO YASUYUKI;NOMURA YASUHIKO;HATA MASAYUKI;SANYO ELECTRIC CO., LTD. 发明人 BESSHO YASUYUKI;NOMURA YASUHIKO;HATA MASAYUKI
分类号 H01L21/78;H01L33/00 主分类号 H01L21/78
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