EMITTER OF FIELD IONIZATION TYPE ION SOURCE, FOCUSED ION BEAM DEVICE AND FOCUSED ION BEAM IRRADIATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a focused ion beam device which exhibits high throughput of sample processing by increasing the amount of ion beam used for irradiating a sample.

SOLUTION: In the emitter of a field ionization type ion source which emits an ion beam 7 by field ionizing gas supplied to the emitter 1 with an electric field formed at the tip thereof, the tip of the emitter 1 consists of a protrusion 1c of atomic level, a spherical part having a protrusion, and a columnar portion continuous to the spherical part and having a slope angle. The spherical part has a radius of curvature of 110 nm or more and a slope angle of 15° or less in the focused ion beam device including the emitter of the field ionization type ion source.

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