发明名称 MEASURING METHOD USING OBLIQUE INCIDENCE INTERFEROMETER
摘要 <P>PROBLEM TO BE SOLVED: To provide a measuring method using an oblique incidence interferometer with which the shapes of a plurality of faces arranged at the positions different from each other in their height direction can be measured collectively and with high accuracy. <P>SOLUTION: A measuring method using an oblique incidence interferometer includes a measuring light incidence step S1 in which measuring light enters a plurality of surfaces arranged substantially parallel to each other at the positions different in their direction normal to the incidence surface of an object to be measured of the measuring light, a surface shape measuring step S2 for measuring the shapes of the plurality of surfaces using measuring light reflected on the plurality of surfaces and an inclination measuring step S3 for measuring the inclination of one surface with respect to another one of the plurality of the surfaces. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011232198(A) 申请公布日期 2011.11.17
申请号 JP20100103255 申请日期 2010.04.28
申请人 MITSUTOYO CORP 发明人 KURIYAMA YUTAKA;OTOGE SATOYA
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
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