发明名称 SEMICONDUCTOR DEVICE
摘要 Disclosed is a high-voltage diode structure which realizes high reverse recovery capability and high maximum allowable forward current. The distance between a longitudinal end of a p well layer in an anode region and an element isolation region formed to surround the diode is 5 μm or shorter so as to allow a depletion layer to reach the element isolation region when a maximum rated reverse voltage is applied. During reverse recovery, the electric field strength at an end portion of a p well layer is reduced, hole current is reduced, and local temperature rises are reduced.
申请公布号 US2011278669(A1) 申请公布日期 2011.11.17
申请号 US201113105145 申请日期 2011.05.11
申请人 MIYOSHI TOMOYUKI;WADA SHINICHIRO;OSHIMA TAKAYUKI;YANAGIDA YOHEI;FUJITA TAKAHIRO;HITACHI, LTD. 发明人 MIYOSHI TOMOYUKI;WADA SHINICHIRO;OSHIMA TAKAYUKI;YANAGIDA YOHEI;FUJITA TAKAHIRO
分类号 H01L29/78 主分类号 H01L29/78
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