发明名称 |
A SYSTEM FOR PRODUCING PATTERNED SILICON CARBIDE STRUCTURES |
摘要 |
The invention is directed to methods of forming ceramic pattern structures of silicon carbide film. In one method, an electron-beam resist or a photo-resist is deposited onto a substrate. A portion of the resist is selectively removed from the substrate to form a resist pattern on the substrate. A film of pre-ceramic polymer that includes silicon and carbon is deposited onto the substrate and resist pattern and the pre-ceramic polymer film is cured. A portion of the cured pre-ceramic polymer film on the resist pattern is removed, thereby forming a pre-ceramic polymer pattern on the substrate. Finally, the pre-ceramic polymer pattern is converted to a ceramic pattern. In another method, a mold comprising cavities having the shape of a desired structure is prepared and placed against a surface of a substrate on which the desired structure is to be formed. A pre-ceramic polymer is introduced into the mold and then cured, and the mold is removed from the substrate, thereby forming a pre-ceramic polymer pattern on the substrate. Finally, the pre-ceramic polymer pattern is converted to a ceramic pattern. |
申请公布号 |
WO2011068884(A3) |
申请公布日期 |
2011.11.17 |
申请号 |
WO2010US58575 |
申请日期 |
2010.12.01 |
申请人 |
UNIVERSITY OF MASSACHUSETTS;THERRIEN, JOEL, M.;SCHMIDT, DANIEL, F. |
发明人 |
THERRIEN, JOEL, M.;SCHMIDT, DANIEL, F. |
分类号 |
G03F7/00;G03F7/16 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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