发明名称 |
ETCHING ACID WASTE LIQUID DISPOSAL SYSTEM, ETCHING ACID WASTE LIQUID DISPOSAL APPARATUS AND ETCHING ACID WASTE LIQUID DISPOSAL METHOD APPLIED TO THE SYSTEM AND THE APPARATUS |
摘要 |
PURPOSE: An etching acid waste liquid disposal system, an etching acid waste liquid disposal apparatus, and an etching acid disposal method are provided to reduce the waste of etching acid by circulating and reusing the etching acid waste liquid without the mixture of another waste liquid. CONSTITUTION: A filter(2) removes solid materials. An ion exchange resin tower(3) remove positive metal ions. The filter and the ion exchange resin tower are connected by an etching acid waste liquid disposal circulation path(5). The etching acid waste liquid disposal circulation path includes an inlet(6) to which the etching acid waste liquid is inputted. The filter is connected to a pump(7) and a flow meter(8) by the etching acid waste liquid circulation path.
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申请公布号 |
KR20110124724(A) |
申请公布日期 |
2011.11.17 |
申请号 |
KR20110043812 |
申请日期 |
2011.05.11 |
申请人 |
ECOCYCLE CORPORATION;SHIBAURA MECHATRONICS CORPORATION |
发明人 |
HIMI HIDEKI;SREENIVASULU REDDY PUCHALAPALLI;ABE MASAHIRO;ISO AKINORI |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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