METHODS FOR SILICON THIN FILM DEPOSITION WITH ENERGETIC BEAM IRRADIATION,申请号KR20100084829-传众专利搜索

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发明名称	METHODS FOR SILICON THIN FILM DEPOSITION WITH ENERGETIC BEAM IRRADIATION
摘要
申请公布号	KR101084495(B1)	申请公布日期	2011.11.17
申请号	KR20100084829	申请日期	2010.08.31
申请人		发明人
分类号	H01L21/26;H01L21/205	主分类号	H01L21/26
代理机构		代理人
主权项
地址

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