发明名称 Semiconductor Devices Having Gates Including Oxidized Nickel and Related Methods of Fabricating the Same
摘要 Schottky barrier semiconductor devices are provided including a wide bandgap semiconductor layer and a gate on the wide bandgap semiconductor layer. The gate includes a metal layer on the wide bandgap semiconductor layer including a nickel oxide (NiO) layer. Related methods of fabricating devices are also provided herein.
申请公布号 US2011278590(A1) 申请公布日期 2011.11.17
申请号 US20100778334 申请日期 2010.05.12
申请人 MIECZKOWSKI VAN;HAGLEITNER HELMUT;HABERERN KEVIN 发明人 MIECZKOWSKI VAN;HAGLEITNER HELMUT;HABERERN KEVIN
分类号 H01L29/778;H01L21/335;H01L21/338;H01L29/20;H01L29/24;H01L29/80 主分类号 H01L29/778
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