| 发明名称 |
CLEANING METHOD AND CLEANING DEVICE |
| 摘要 |
<p>In the disclosed method, a treated object (48) is cleaned by means of jetting a cleaning fluid (5) towards the treated object (48) wherein a metal film (18) having a predetermined pattern is formed on the surface of a substrate (4). During this, by means of jetting a cleaning fluid (5) that contains gaseous micro-nano bubbles (40) having a negative zeta potential, metal oxides (49) having a positive zeta potential formed on the surface (4a) of the substrate (4) are removed.</p> |
| 申请公布号 |
WO2011142060(A1) |
申请公布日期 |
2011.11.17 |
| 申请号 |
WO2011JP00295 |
申请日期 |
2011.01.20 |
| 申请人 |
SHARP KABUSHIKI KAISHA;TANAKA, JUNICHI |
发明人 |
TANAKA, JUNICHI |
| 分类号 |
B08B3/02;G02F1/13;H01L21/304;H01L51/50;H05B33/10 |
主分类号 |
B08B3/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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