发明名称 BUFFER LAYER FORMING METHOD IN DYE-SENSITIZED SOLAR CELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a buffer layer forming method in a dye-sensitized solar cell capable of using high temperature sensitive materials, such as synthetic resin, as a substrate. <P>SOLUTION: This is a forming method for a buffer layer arranged between a transparent electrode and a photocatalyst film in a dye-sensitized solar cell which comprises; the transparent electrode; an opposite electrode; an electrolyte layer arranged between the both electrodes; the photocatalyst film arranged between the both electrodes and on the transparent electrode side. A mixed liquid B made by dissolving metal alkoxide which is a photocatalyst precursor into an alcoholic solution is sprayed onto the surface of the transparent electrode 1 by a liquid spray nozzle 61. Immediately after spraying, the mixture is baked by spraying overheat steam H thereon from a steam spray nozzle 62, thus forming the buffer layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011233376(A) 申请公布日期 2011.11.17
申请号 JP20100102790 申请日期 2010.04.28
申请人 HITACHI ZOSEN CORP 发明人 SUGIO TAKESHI;INOUE TETSUYA
分类号 H01M14/00;H01L31/04 主分类号 H01M14/00
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