METAL FILM FORMING SYSTEM, METHOD FOR FORMING METAL FILM AND COMPUTER RECORDING MEDIUM

摘要

Disclosed is a metal film forming system comprising a carry in/out station for carrying substrates in and out, a preprocessing station that forms a base film on a substrate, a main processing station that applies a liquid metal mixture onto the substrate on which the base film has been formed and forms a metal film on the substrate, and a load lock unit that connects the carry in/out station, preprocessing station, and main processing station. The preprocessing station, main processing station, and load lock unit are constituted such that switching to an inert gas atmospheric pressure atmosphere or reduced pressure atmosphere is possible in each of them.