发明名称 |
ABRASIVE TOOL FOR USE AS A CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER |
摘要 |
An abrasive tool including a CMP pad conditioner having a substrate including a first major surface, a second major surface opposite the first major surface, and a side surface extending between the first major surface and the second major, wherein a first layer of abrasive grains is attached to the first major surface and a second layer of abrasive grains is attached to the second major surface. The conditioner further includes a first sealing member extending in a peripheral direction along a portion of the side surface of the substrate. |
申请公布号 |
KR20110124370(A) |
申请公布日期 |
2011.11.16 |
申请号 |
KR20117023709 |
申请日期 |
2009.12.31 |
申请人 |
SAINT-GOBAIN ABRASIVES, INC.;SAINT-GOBAIN ABRASIFS |
发明人 |
DINH NGOC CHARLES;RAMANATH SRINIVASAN;SCHULZ ERIC M.;WU JIANHUI;PUTHANANGADY THOMAS;VEDANTHAM RAMANUJAM;HWANG TAEWOOK |
分类号 |
H01L21/304;B24B37/04;B24B53/12 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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