| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a grayscale mask that gives a drastic change in the film thickness of a photosensitive resist in a region corresponding to the boundary between a light-shielding region and a translucent region upon exposing and developing the photosensitive resist. Ž<P>SOLUTION: The grayscale mask comprises a transparent substrate 1, a light-shielding film 2 formed on the transparent substrate, and a translucent film 3 formed on the transparent substrate, wherein the mask has a pattern having a transmissive region (c) where the transparent substrate is exposed, a light-shielding region (a) where the light-shielding film is formed on the transparent substrate, and a translucent region (b) where only the translucent film is formed on the transparent substrate, with the light-shielding region and the translucent region being at least partially adjacent to each other. A transmittance adjustment region (d) where the transparent substrate is exposed is formed between the light-shielding region and the translucent region adjacent to each other so as to improve the light profile of the boundary of the light-shielding region and the translucent region. Ž<P>COPYRIGHT: (C)2008,JPO&INPIT Ž</p> |
