| 摘要 |
PURPOSE: A chemically amplified photo-resist composition for micro lenses and the micro lenses manufactured using the same are provided to maintain the transmittance of the micro lenses by preventing the coloring phenomenon of the micro lenses at high temperatures. CONSTITUTION: A chemically amplified photo-resist composition for micro lenses includes a copolymer resin represented by chemical formula 1, a copolymer resin represented by chemical formula 2, an acid generator, and a quencher. In the chemical formulas 1 and 2, the R1 is a hydrogen element or a methyl group. The R2 is a C1 to C10 linear, branched, or cyclic alkyl group. The R3 is a hydroxyl group. The R4 is a hydrogen element or a methyl group. The R5 is a hydrogen element or a C3 to C10 cyclic compound. The R6 is a C1 to C5 alkyl group substituted or non-substituted oxetyl group. The a1, b1, a2, b2, and c2 are the molar ratios of each monomer and are respectively the real numbers of 0 to 1. |
