发明名称 |
SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>A Schottky barrier diode includes an epitaxial growth layer disposed on a substrate and having a mesa portion, and a Schottky electrode disposed on the mesa portion, wherein a distance between an edge of the Schottky electrode and a top surface edge of the mesa portion is 2 µm or less. Since the distance x is 2 µm or less, a leakage current is significantly decreased, a breakdown voltage is improved, and a Schottky barrier diode having excellent reverse breakdown voltage characteristics is provide.</p> |
申请公布号 |
EP2043157(A4) |
申请公布日期 |
2011.11.16 |
申请号 |
EP20080722464 |
申请日期 |
2008.03.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO |
分类号 |
H01L29/872;H01L21/329 |
主分类号 |
H01L29/872 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|