发明名称 SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A Schottky barrier diode includes an epitaxial growth layer disposed on a substrate and having a mesa portion, and a Schottky electrode disposed on the mesa portion, wherein a distance between an edge of the Schottky electrode and a top surface edge of the mesa portion is 2 µm or less. Since the distance x is 2 µm or less, a leakage current is significantly decreased, a breakdown voltage is improved, and a Schottky barrier diode having excellent reverse breakdown voltage characteristics is provide.</p>
申请公布号 EP2043157(A4) 申请公布日期 2011.11.16
申请号 EP20080722464 申请日期 2008.03.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO
分类号 H01L29/872;H01L21/329 主分类号 H01L29/872
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