| 摘要 |
A system and method are utilized to equalize intensity or energy in various diffraction order portions of a patterned beam. The patterned beam is formed using a diffractive patterning device. An attenuator is placed at a pupil of a projection system to attenuate respective diffraction order portions of the patterned beam. The projection device is also used to project the patterned beam onto a target portion of a substrate, after the respective attenuations. |
