发明名称 Method and material for processing iron disilicide for photovoltaic application
摘要 A method for providing a semiconductor material for photovoltaic devices, the method includes providing a sample of iron disilicide comprising approximately 90 percent or greater of a beta phase entity. The sample of iron disilicide is characterized by a substantially uniform first particle size ranging from about 1 micron to about 10 microns. The method includes combining the sample of iron disilicide and a binding material to form a mixture of material. The method includes providing a substrate member including a surface region and deposits the mixture of material overlying the surface region of the substrate. In a specific embodiment, the mixture of material is subjected to a post-deposition process such as a curing process to form a thickness of material comprising the sample of iron disilicide overlying the substrate member. In a specific embodiment, the thickness of material is characterized by a thickness of about the first particle size.
申请公布号 US8058092(B2) 申请公布日期 2011.11.15
申请号 US20080210173 申请日期 2008.09.12
申请人 LEE HOWARD W. H.;MIKULEC FREDERIC VICTOR;GAO BING SHEN;HUANG JINMAN;STION CORPORATION 发明人 LEE HOWARD W. H.;MIKULEC FREDERIC VICTOR;GAO BING SHEN;HUANG JINMAN
分类号 H01L21/00;H01L21/44 主分类号 H01L21/00
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