发明名称 |
Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
摘要 |
An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing. |
申请公布号 |
US8057601(B2) |
申请公布日期 |
2011.11.15 |
申请号 |
US20070746392 |
申请日期 |
2007.05.09 |
申请人 |
KOELMEL BLAKE;LERNER ALEXANDER N.;RANISH JOSEPH M.;SANGAM KEDARNATH;SORABJI KHURSHED;APPLIED MATERIALS, INC. |
发明人 |
KOELMEL BLAKE;LERNER ALEXANDER N.;RANISH JOSEPH M.;SANGAM KEDARNATH;SORABJI KHURSHED |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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