| 摘要 |
A semiconductor structure includes a number of semiconductor regions, a pair of dielectric regions and a pair of terminals. The first and second regions of the structure are respectively coupled to the first and second terminals. The third region of the structure is disposed between the first and second regions. The dielectric regions extend into the third region. A concentration of doping impurities present in the third region and a distance between the dielectric regions define an electrical characteristic of the structure. The electrical characteristic of the structure is independent of the width of the dielectric regions width. The first and second regions are of opposite conductivity types. The structure optionally includes a fourth region that extends into the third region, and surrounds a portion of the pair of dielectric regions. The interface region between the dielectric regions and the fourth region includes intentionally introduced charges.
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