| 发明名称 |
Exposure apparatus, image forming apparatus and heating method |
| 摘要 |
The exposure apparatus is provided with: a substrate; plural light emitting elements that are arranged in a line on a first surface of the substrate; and a heating unit that heats the substrate from the first surface side. |
| 申请公布号 |
US8059147(B2) |
申请公布日期 |
2011.11.15 |
| 申请号 |
US20080021502 |
申请日期 |
2008.01.29 |
| 申请人 |
TAIRA YOSHIHIKO;HOUKI YOUJI;MATSUSHITA YUKIHIRO;FUJI XEROX CO., LTD. |
发明人 |
TAIRA YOSHIHIKO;HOUKI YOUJI;MATSUSHITA YUKIHIRO |
| 分类号 |
B41J15/14;B41J2/45;B41J27/00 |
主分类号 |
B41J15/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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