发明名称 |
Micro-electro-mechanical device and manufacturing method for the same |
摘要 |
It is an object of the present invention to provide a micro-electro-mechanical-device having a microstructure and a semiconductor element over one surface. In particular, it is an object of the present invention to provide a method for simplifying the process of forming the microstructure and the semiconductor element over one surface. A space in which the microstructure is moved, that is, a movable space for the microstructure is formed by processing an insulating layer which is formed in a process of forming the semiconductor element. The movable space can be formed by forming the insulating layer having a plurality of openings and making the openings face each other to be overlapped each other. |
申请公布号 |
US8058145(B2) |
申请公布日期 |
2011.11.15 |
申请号 |
US20100842061 |
申请日期 |
2010.07.23 |
申请人 |
TATEISHI FUMINORI;IZUMI KONAMI;YAMAGUCHI MAYUMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TATEISHI FUMINORI;IZUMI KONAMI;YAMAGUCHI MAYUMI |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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