| 摘要 |
PURPOSE: A process malfunction monitoring apparatus is provided to sense process malfunction by sensing concentration of gas according to change and type of processing gas and executing a time sharing process and to offer simple configuration and to reduce production costs by reducing the number of spectrometers by one. CONSTITUTION: A switching unit(20) selects one among optical signals which are received from a processing chamber. A spectrometer(30) measures emissive power by dividing a selected optical signal according to a wavelength area. A controller(40) comprises a driving control unit which controls the operation of a driving unit and a monitoring unit. The monitoring unit is determined whether a malfunction is generated within the processing chamber or not. A manipulation unit(50) inputs a translation inputs interval and a translation distance of the driving unit.
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