| 摘要 |
<p>PURPOSE: An extreme ultra violet mask and a manufacturing method thereof are provided to prevent shading effects. CONSTITUTION: A reflecting layer(115) is arranged on a reflecting region(I) of a substrate(100). An oxide layer(125) is arranged on an absorption region(II) of the substrate. The reflecting layer is arranged by successively laminating a plurality of molybdenum(105) and silicon(110). A photosensitive film is applied on the upper part of the reflecting layer. The photosensitive pattern is arranged by performing an exposure and development process on the photosensitive film.</p> |
