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发明名称
METHOD FOR DEPOSITING THIN FILM
摘要
<p>이와 같은 본 발명은, 공정 준비시에는 메인 배기부를 이용한 하방 배기 방식을 통해 챔버 내부를 신속하게 배기함으로써 공정 준비 시간을 단축할 수 있으며, 박막 공정시에는 서브 배기부를 이용한 측방 배기 방식을 통해 기판 표면에 균일한 가스 흐름을 형성함으로써 박막 균일도를 향상시킬 수 있다.</p>
申请公布号
KR101083234(B1)
申请公布日期
2011.11.14
申请号
KR20090064050
申请日期
2009.07.14
申请人
发明人
分类号
C23C16/52;H01L21/205
主分类号
C23C16/52
代理机构
代理人
主权项
地址
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