| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a repair method and system that removes a defect of a half tone mask by using a laser, can efficiently form a block film in a defect area, adjusts a film thickness of the block film, enables the defect to be removed even after a pellicle film is formed, adjusts permeability in real time so as to carry out a repair process, and guarantees the uniformity of the permeability of a repaired section. <P>SOLUTION: In a repair method for a half tone mask, a defect section in a semi-transparent area of the half tone mask is repaired by irradiating a source material with a laser to evaporate it onto the defect section of a semi-transparent layer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
