| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a material for a suction pad that sucks and holds an object to be polished and that hardly produces deviation from the surface plate of a polishing machine during polishing, in polishing a substrate, a lens, liquid crystal glass, etc., for use in precision machinery. <P>SOLUTION: In the method of manufacturing the material for the suction pad, a porous layer composed of a polymer elastic body exists on the surface of a base material. The method includes: bringing a film surface for pressing into close contact with the surface of the porous layer; heating the surface of the porous layer by a heater in contact with the rear surface of the film in a state of not being bent; and pressing it. Further, it is preferable that the material for the suction pad is the one obtained by directly wet-forming the porous layer on the base material, and that the base material constituting the suction pad material is composed of a synthetic resin film as the base and an adhesive layer. Furthermore, it is preferable that the heater has a metal roll shape or metal planar shape, that the heating temperature is 60-200°C, and that the arithmetic average surface roughness Ra of the film for pressing is 0.01-0.50 μm. <P>COPYRIGHT: (C)2012,JPO&INPIT |
