发明名称 REFLECTIVE OPTICAL ELEMENT, PROJECTION SYSTEM AND PROJECTION/EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a reflective optical element of a wavelength range from ultraviolet to extreme ultraviolet, having on a substrate a reflective face provided with a multi-layer system having layers of at least two alternating materials, and a projection/exposure device. <P>SOLUTION: There is proposed a reflective optical element provided with a multi-layer system having layers (41, 42) of at least two alternating materials whose working wavelengths have real number parts with different refraction factors, wherein radiations having a certain distribution of incidence angle bandwidths, which is the working wavelength, can be brought to incidence on the reflective optical element, a reflective face includes one or more first part or parts (A1) of which the layers (41, 42) have alternating materials of a thickness of a first period (P1) and one or more other part or parts (A2) of which the layers (41, 42) of alternating materials have thickness of the first (P1) and at least one other period (P2), and the alignment of the first part or parts (A1) and the other part or parts (A2) over the reflective face is adapted to the distribution of incident angle bandwidths. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011228699(A) 申请公布日期 2011.11.10
申请号 JP20110084032 申请日期 2011.03.17
申请人 CARL ZEISS SMT GMBH 发明人 HANS-JURGEN MAN
分类号 H01L21/027;G02B5/08;G02B13/22;G02B17/00;G03F7/20 主分类号 H01L21/027
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